The UHV SEM Lab -S allows true in-situ structural and chemical surface analysis. Imaging, spectroscopy and nanostructuring capabilities are combined in a unique, powerful turn-key system. The basic version features outstanding UHV SEM functionality like an ultimate resolution below 3 nm in UHV at 8 mm working distance, and is optimised for superior performance at low beam voltages down to below 1 kV and high beam currents.
Optionally, the system can be extended with analytical techniques such as STM, SAM, SEMPA or sample preparation facilities.
The sample is mounted on a goniometer, and can be precisely positioned with micro slides in x, y and z. These 4 degrees of freedom increase the flexibility for true in situ analysis at the same sample location with various spectroscopic methods such as STM, SAM, EDX/WDX, SEMPA, cathodoluminescence etc.
In addition to the In-Lens SED, a separate external SED is provided for contrast enhancement and detection of backscattered electrons.
The UHV system is designed to meet the stringent requirements of SEM as wll as STM operating modes: mu-metal shielding for reduction of AC magnetic noise, low mechanical vibrations due to a combination of vibration isolation, ion getter pumps, and an extremely rigid chamber and bench frame design.
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