UHV NANOPROBE

Ultimate Nanoprobing with Four Independent Scanning Probe Microscopes

Probe module coarse positioning:  
XYZ = 10 mm x 10 mm x 5 mm (piezo-electric inertia drives)

Probe fine positioning: 
XY ≥ 4 µm, Z = 2.5 µm (single-tube piezo)

Probe length:  
5 - 8 mm (typical)

Probe STM resolution: 
Atomic steps on Au (standard probe, STM electronics required, high-resolution probe module on request)

Probe STM current:  
3 nA / 330 nA ranges (Omicron SPM PRE 4E, lowest STM imaging current < 5 pA, other pre-amps on request)

Probe & sample exchange:  
In-vacuum (wobble-stick transfer)

 

 

Sample stage coarse positioning:   
XY = 10 mm x 10 mm (piezo-electric inertia drives)

Sample size:  
10 mm x 10 mm (standard flat plates)

Sample heating:  
Tmax = 500 K (solid state heater element), sample temperature measurement: Pt100

 

 

Electrical probe connection:  
Sub-D 25 (low-noise coaxial cable with floating shield) 

Bakeout temperature:  
180 °C (complete systems include bakeout panels, controller, etc.)

 

 

Options

UHV NANOPROBE stage positioning:  
External precision XY-manipulator with ø 14 mm vectorial range, recommended for combination with SEM/SAM

Sample cooling:  
Tmin = 50 K (LHe flow cryostat, lower temperatures on request)

Probe & sample position readout: 
± 50 nm (nominal encoder resolution) 

Electrical sample contacts: 
4 spring-loaded sample contacts, connected by 4 separate twisted pair wires

STM pre-amplifier switch: 
Signal re-routing from STM pre-amplifier to external BNC connector, remote or TTL control

Optical probes: 
Glasfibre with in-vacuum optical coupling and exchangeable optical probe (on request)

Control electronics PCU 2:  
Manual probe fine positioning, coarse positioning (for two probes)

Control electronics PCU 1R / 2R:   
Manual probe fine positioning, coarse positioning, STM feedback/approach (1R: for one probe, 2R: for two probes)

MATRIX SPM control system:  
Fully equipped STM control electronics, data processing, etc. (for one probe)

UHV Gemini column:  
4 nm resolution at 12 mm working distance, in-lens SED, external SED, control electronics and software

FEI SEM 20:  
20 nm resolution, external SED, control electronics & software (other SEM columns on request)

FIB: 
Orsay Focussed Ion Beam source (on request)

SEMPA: 
SEM with polarisation analysis (on request) 

 

Note: Specifications and descriptions contained in this website are subject to alteration without notice. For guaranteed specifications please inquire official documentation.
  

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