Nanotechnology is our profession!

• Scanning Probe Microscopy
• Electron Spectroscopy
• Thin Film Solutions
• Tailored UHV Systems
• Nanoprobing & Nanotools

High-performance technology products for research and industry.

Next Generation Hemispherical Analyser

• Excellent Sensitivity
• Compresion Lens
• True Counting Multi-Anode Detector
• Linear Response up to the Highest Count Rates
• Excellent Dynamic Range
• Snapshot and Dynamic XPS
• Chemical State Mapping

Version V 3.1

• Intuitive user interface
• Predefined experiment setup
• Excellent data management

A Family of Multi-Technique Surface

• Science Systems - Single Supplier, Total Support for Multiple Techniques
• Flexible, Turn-Key UHV Systems
• Designed According to Customer’s Requirements

SPM in a Temperature Range from 15 K to 400 K

• Compact Design• Compact Design
• Tip and Sample Cooled
• Low Thermal Drift
• STM, AFM & Spectroscopy
• Sub pA STM
• Sensor Exchange & 2D Coarse

• Best Hardware Performance and S/N
• 24 Bit z-Resolution
• Intuitive User Interface
• Dedicated and Advanced Spectroscopy Modes
• Flexible Experiment Control
• AFM Controller with Digital PLL
• Fast Scan Imaging & High Data Transfer Rates
• Data Management with ‘Vernissage’

Next Generation Hemispherical Analyser

• Excellent Sensitivity
• True Counting Multi-Anode Detector
• Linear Response up to the Highest Count Rates
• Excellent Dynamic Range
• Snapshot and Dynamic XPS
• Chemical State Mapping

Ultimate Probing at the Nanoscale

• Four Fully Independent Scanning
• Tunnelling Microscopes
• 4-Point Transport Measurements
• Excellent STM Performance for Spectroscopy and Manipulation
• Base Temperature T < 5 K
• High Resolution SEM Navigation

Low Temperature UHV STM and AFM Technology

• Low Temperature Operation at T < 5 K
• Lowest Thermal Drift & Highest Stability
• Ultimate STM/STS/IETS Performance
• Leading QPlus AFM Technology
• Variable Temperature Operation
• Guided 3D Coarse Positioning
• 50 Hours LHe Hold Time & Fast Cool Down
• Safe & Quick Sample/Tip Exchange

Benchmarking UHV STM and AFM Technology

• 25K – 1500 K
• True pA STM
• Improved dI/dV Spectroscopy
• Beam Deflection AFM
• QPlus AFM
• In-situ Evaporation

Benchmarking UHV STM and AFM Technology - The VT XA Series

• 50 K – 500 K / 650 K
• True pA STM
• Improved dI/dV Spectroscopy
• Beam Deflection AFM
• QPlus AFM
• In-situ Evaporation

The legendary STM developed by Omicron.

• Unsurpassed stability and resolution
• Eddy current damping
• UHV sample/tip exchange
• In-vacuum I/V converter

LAB-10 MBE System
EVO-25 /-50 MBE System
PRO-75 /-100 MBE System

• Growth System Solutions for all Fields of Application
• Layer Growth with Outstanding Performance
• Excellent Sample Thickness & Doping Homogenity
• Low Background Doping Level
• Very Low Defect Density
• Excellent Carrier Density & Mobility
• Installation & Customer Training by Experienced MBE-Engineers

Lab-10⁺ MBE/SPM System with Deposition Chamber, optional Preparation/Storage Chamber and with Loadlock Chamber

LAB-10 MBE System: Standard System with Preparation/Storage Chamber and with Loadlock Chamber

EV0-25 and EVO-50 MBE System:

• Standard System with Preparation/Storage
• Chamber and with Loadlock Chamber

PR0-75 and PRO-100 MBE System: Standard System with Preparation/Storage Chamber and with Loadlock Chamber

Ultra-Pure submonolayer and Multilayer Thin Film Growth

• Evaporation from Wires, Rods or Crucibles
• Temperature Range up to 3300 °C
• Integrated Flux Monitor
• Water Cooling for Minimum Pressure Rise
• Rear Loading for Aglinment Preservation
• Comfortable Lab View-based PC Software

Photo Emission Electron Microscope

• 20 nm Lateral Resolution
• Easy to Operate
• Real-Time Imaging
• Surface Sensitivity Microscopy
• Chemical Mapping
• Local Spectroscopy
• Compatible with MULTIPROBE UHV Systems

Omicron‘s patented fi ne positioning technology, developed for use under the stringent conditions of ultra-high vacuum, has proven its ability to perform with accuracy and reliability in countless exacting applications in laboratories throughout the world.

The ISE 5 is a compact and versatile ion sputtering source which offers a low energy capability, making it the ideal source for cleaning sensitive samples and single crystals routinely used in SPM research. It is very simple and easy to use with long operating times.

The EKF 300 Electron Source with the NGE 52 Electron Source Power Supply is a highly versatile 0.1 to 5 keV electron source designed for both static Auger measurements and for use as an electron foold source. The spot size can be adjusted down to 300 µm within an energy range from 1 keV to 5 keV at the standard working distance of 66 mm.

The CN 10 is an electron source for charge neutralisation. The low energy spread of the Ba0 filament ensures ultimate XPS resolution on insulators. it is optimised for high beam currents down to lowest energies (10 eV and below).

Cascade is at the core of ESCA+ family and is available across the entire Omicron ESCA product range ensuring the highest levels of performance and support for all CASCADE users.

Low Temperature ³He & ⁴He SPM Operation in High Magnetic Fields

• Low temperatures of below 500 mK
• High magnetic fields of up to 12 T
• Cryostat hold time of up to 160 h
• Continuous SPM operation during magnetic field variation
• Spring suspension for mechanical decoupling between cryostat and microscope

AFM Benchmark Performance

• Atomic Resolution AFM at the Highest Performance Levels
• High Bandwidth for Working at High Frequencies
• Simultaneous STM & STS
• QPlus AFM from 5 K to 300 K with the LT STM
• QPlus AFM from 25 K to > 1000 K with the VT SPM Series

Scanning Auger with Ultimate Resolution

• 5 nm SAM Resolution
• 3 nm SEM Resolution
• Depth Profi ling and Charge Neutralisation
• Additional Techniques: EBSD, SEMPA, FIB, EBL

Four Independent Scanning Probe Microscopes

• 4-Point Transport Measurements on Nanostructures
• Electrical Contacting of Nanodevices
• STM-Based Safe & Non-Destructive Tip Approach
• Full STM Capability
• High-Resolution, < 4 nm SEM Imaging for Rapid Tip Navigation
• High-Resolution, < 10 nm SAM Imaging for Chemical Mapping
• True UHV Operation for Clean & Artefact-Free Surfaces

Imaging XPS and Small Spot Spectroscopy

• ESCA Lateral Resolution
• 150 nm with Synchrotron Raditation
• 650 nm Resolution with Al Kα
• Survey Images with < 50 nm PEEM Resolution
• Aberration Corrected Energy Filter
• High Power Monochromatic X-ray Source

Thin Film Metrology

• Atomic Layer Deposition (ALD) provides 'self terminating', controlled ultra-thin film growth
• Precise measurement of thickness, composition & uniformity of ultra-thin films
• Advanced growth & process control for rapid prototyping
• In-vacuum wafer transfer from deposition to analysis for rapid characterisation
• Combination of different deposition processes without capping/de-capping steps
• Direct correlation of process parameters to chemical composition

...with ESCA+ and Multiprobe Thin-Film Technology.

• Measurement of composition, uniformity & thickness of ultra-thin films
• Advanced growth & process control for rapid prototyping
• Rapid identification of films without transfer from UHV

Standard routines in AFM and STM permit a large series of predifined experiments.

Many-body effects in electronic bandgaps of carbon nanotubes measured by scanning tunnelling spectroscopy.